Chemical bond modification in porous SiOCH films by H2 and H2/N2 plasmas investigated by in situ infrared reflection absorption spectroscopy

Hiroshi Yamamoto, Kohei Asano, Kenji Ishikawa, Makoto Sekine, Hisataka Hayashi, Itsuko Sakai, Tokuhisa Ohiwa, Keigo Takeda, Hiroki Kondo, Masaru Hori
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3671547
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The following have contributed to this page: Dr Kenji Ishikawa