Dependence of optimized annealing temperature for tetragonal phase formation on the Si concentration of atomic-layer-deposited Hf-silicate film

Hyo Kyeom Kim, Hyung-Suk Jung, Jae Hyuck Jang, Jinho Park, Tae Joo Park, Seok-Hee Lee, Cheol Seong Hwang
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3665411
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