Bias application hard x-ray photoelectron spectroscopy study of forming process of Cu/HfO2/Pt resistive random access memory structure

T. Nagata, M. Haemori, Y. Yamashita, H. Yoshikawa, Y. Iwashita, K. Kobayashi, T. Chikyow
  • Applied Physics Letters, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3664781
The author haven't yet claimed this publicationThe author haven't yet claimed this publication