Effect of mesh bias on the properties of the lateral conductivity of intrinsic microcrystalline silicon films deposited by low-frequency inductively coupled plasma

  • W. S. Yan, S. Xu, C. C. Sern, D. Y. Wei
  • Applied Physics Letters, November 2011, American Institute of Physics
  • DOI: 10.1063/1.3662419

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http://dx.doi.org/10.1063/1.3662419

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