Structural and morphological characterization of molecular beam epitaxy grown Si∕Ge multilayer using x-ray scattering techniques

M. Sharma, M. K. Sanyal, M. K. Mukhopadhyay, M. K. Bera, B. Saha, P. Chakraborty
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3661165