Erratum: “Ferromagnetism in antiferromagnetic NiO-based thin films” [J. Appl. Phys. 110, 043921 (2011)]

Yuan-Hua Lin, Bin Zhan, Ce-Wen Nan, Rongjuan Zhao, Xiang Xu, M. Kobayashi
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3656440