Process driven oxygen redistribution and control in Si0.7Ge0.3/HfO2/TaN gate stack film systems

Patrick S. Lysaght, Joseph C. Woicik, Jeff Huang, Jungwoo Oh, Byoung-Gi Min, Paul D. Kirsch
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3651519
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