Diffusion behavior of dual capping layers in TiN/LaN/AlN/HfSiOx/Si stack

  • X. H. Zheng, A. P. Huang, Z. S. Xiao, M. Wang, X. Y. Liu, Z. W. Wu, Paul K. Chu
  • Applied Physics Letters, September 2011, American Institute of Physics
  • DOI: 10.1063/1.3643517

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http://dx.doi.org/10.1063/1.3643517

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