Stress evolution during the oxidation of silicon nanowires in the sub-10 nm diameter regime

Byung-Hyun Kim, Mauludi Ariesto Pamungkas, Mina Park, Gyubong Kim, Kwang-Ryeol Lee, Yong-Chae Chung
  • Applied Physics Letters, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3643038
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The following have contributed to this page: DR Mauludi Ariesto Pamungkas