Direct comparison of domain wall behavior in permalloy nanowires patterned by electron beam lithography and focused ion beam milling

S. McVitie, D. McGrouther, J. N. Chapman, J. M. R. Weaver, M. A. Basith
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3642966