A study of the role of various reactions on the density distribution of hydrogen, silylene, and silyl in SiH4/H2 plasma discharges

Aman-ur-Rehman, H. C. Kwon, W. T. Park, J. K. Lee
  • Physics of Plasmas, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3630933
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