Nanomechanical properties of sputter-deposited HfO2 and HfxSi1-xO2 thin films

D. K. Venkatachalam, J. E. Bradby, M. N. Saleh, S. Ruffell, R. G. Elliman
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3627155
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