Susceptor assisted microwave annealing for recrystallization and dopant activation of arsenic-implanted silicon

Rajitha N. P. Vemuri, Mandar J. Gadre, N. D. Theodore, W. Chen, S. S. Lau, T. L. Alford
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3622287