Scaling of flat band potential and dielectric constant as a function of Ta concentration in Ta-TiO2 epitaxial films

Y. L. Zhao, A. Roy Barman, S. Dhar, A. Annadi, M. Motapothula, Jinghao Wang, Haibin Su, M. Breese, T. Venkatesan, Q. Wang
  • AIP Advances, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3609927