Erratum: “Hall resistivity of Fe doped Si film at low temperatures” [Appl. Phys. Lett. 98, 112109 (2011)]

  • Y. Q. Xu, W. F. Su, T. X. Nie, J. Cui, Y. M. Shao, Z. M. Jiang
  • Applied Physics Letters, July 2011, American Institute of Physics
  • DOI: 10.1063/1.3608144

The authors haven't yet claimed this publication.

Read Publication

http://dx.doi.org/10.1063/1.3608144

In partnership with:

Link to American Institute of Physics showcase