The mechanism for the suppression of leakage current in high dielectric TiO2 thin films by adopting ultra-thin HfO2 films for memory application

Minha Seo, Sang Ho Rha, Seong Keun Kim, Jeong Hwan Han, Woongkyu Lee, Sora Han, Cheol Seong Hwang
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3605527
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