Dilution effect of Ar/H2 on the microstructures and photovoltaic properties of nc-Si:H deposited in low frequency inductively coupled plasma

H. P. Zhou, D. Y. Wei, S. Xu, S. Q. Xiao, L. X. Xu, S. Y. Huang, Y. N. Guo, W. S. Yan, M. Xu
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3605288
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