Hafnium dioxide as a passivating layer and diffusive barrier in ZnO/Ag Schottky junctions obtained by atomic layer deposition

Elzbieta Guziewicz, Tomasz A. Krajewski, Grzegorz Luka, Sylwia Gieraltowska, Adam J. Zakrzewski, Petro S. Smertenko, Piotr Kruszewski, Lukasz Wachnicki, Bartlomiej S. Witkowski, Elzbieta Lusakowska, Rafal Jakiela, Marek Godlewski
  • Applied Physics Letters, June 2011, American Institute of Physics
  • DOI: 10.1063/1.3604796
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