The nature of the defects generated from plasma exposure in pristine and ultraviolet-cured low-k organosilicate glass

  • H. Ren, G. Jiang, G. A. Antonelli, Y. Nishi, J. L. Shohet
  • Applied Physics Letters, June 2011, American Institute of Physics
  • DOI: 10.1063/1.3601922

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http://dx.doi.org/10.1063/1.3601922

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