High-k (k=30) amorphous hafnium oxide films from high rate room temperature deposition

Flora M. Li, Bernhard C. Bayer, Stephan Hofmann, James D. Dutson, Steve J. Wakeham, Mike J. Thwaites, William I. Milne, Andrew J. Flewitt
  • Applied Physics Letters, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3601487
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