Effects of patterning induced stress relaxation in strained SOI/SiGe layers and substrate

P. Hermann, M. Hecker, F. Renn, M. Rölke, K. Kolanek, J. Rinderknecht, L. M. Eng
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3597641