Origin of resistivity change in NiO thin films studied by hard x-ray photoelectron spectroscopy

P. Calka, E. Martinez, D. Lafond, S. Minoret, S. Tirano, B. Detlefs, J. Roy, J. Zegenhagen, C. Guedj
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3596809