Nitrogen self-diffusion in magnetron sputtered Si-C-N films

E. Hüger, H. Schmidt, T. Geue, J. Stahn, U. Tietze, D. Lott, A. Markwitz, U. Geckle, M. Bruns
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3585780
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