Impact of ultrathin Al2O3 diffusion barriers on defects in high-k LaLuO3 on Si

  • S. Shen, Y. Liu, R. G. Gordon, L. J. Brillson
  • Applied Physics Letters, April 2011, American Institute of Physics
  • DOI: 10.1063/1.3583462

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http://dx.doi.org/10.1063/1.3583462

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