Influence of high power impulse magnetron sputtering plasma ionization on the microstructure of TiN thin films

A. P. Ehiasarian, A. Vetushka, Y. Aranda Gonzalvo, G. Sáfrán, L. Székely, P. B. Barna
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3579443
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