UV nanoimprint lithography for the realization of large-area ordered SiGe/Si(001) island arrays

E. Lausecker, M. Brehm, M. Grydlik, F. Hackl, I. Bergmair, M. Mühlberger, T. Fromherz, F. Schäffler, G. Bauer
  • Applied Physics Letters, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3575554