Method for fabricating third generation photovoltaic cells based on Si quantum dots using ion implantation into SiO2

M. Yedji, J. Demarche, G. Terwagne, R. Delamare, D. Flandre, D. Barba, D. Koshel, G. G. Ross
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3575325
The author haven't yet claimed this publicationThe author haven't yet claimed this publication