Impact of diffusionless anneal using dynamic surface anneal on the electrical properties of a high-k/metal gate stack in metal-oxide-semiconductor devices

  • Changhwan Choi, Kam-Leung Lee, Vijay Narayanan
  • Applied Physics Letters, March 2011, American Institute of Physics
  • DOI: 10.1063/1.3570655

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http://dx.doi.org/10.1063/1.3570655

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