Effect of high-pressure oxygen annealing on negative bias illumination stress-induced instability of InGaZnO thin film transistors

  • Kwang Hwan Ji, Ji-In Kim, Hong Yoon Jung, Se Yeob Park, Rino Choi, Un Ki Kim, Cheol Seong Hwang, Daeseok Lee, Hyungsang Hwang, Jae Kyeong Jeong
  • Applied Physics Letters, March 2011, American Institute of Physics
  • DOI: 10.1063/1.3564882

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http://dx.doi.org/10.1063/1.3564882

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