H2/N2 plasma damage on porous dielectric SiOCH film evaluated by in situ film characterization and plasma diagnostics

Hiroshi Yamamoto, Keigo Takeda, Kenji Ishikawa, Masafumi Ito, Makoto Sekine, Masaru Hori, Takeshi Kaminatsui, Hisataka Hayashi, Itsuko Sakai, Tokuhisa Ohiwa
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3562161
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The following have contributed to this page: Dr Kenji Ishikawa