Impact of static and dynamic stress on threshold voltage instability in high-k/metal gate n-channel metal-oxide-semiconductor field-effect transistors

  • Chih-Hao Dai, Ting-Chang Chang, Ann-Kuo Chu, Yuan-Jui Kuo, Wen-Hung Lo, Szu-Han Ho, Ching-En Chen, Jou-Miao Shih, Hua-Mao Chen, Bai-Shan Dai, Guangrui Xia, Osbert Cheng, Cheng Tung Huang
  • Applied Physics Letters, February 2011, American Institute of Physics
  • DOI: 10.1063/1.3560463

The authors haven't yet claimed this publication.

Read Publication

In partnership with:

Link to American Institute of Physics showcase