Study of roughness evolution and layer stacking faults in short-period atomic layer deposited HfO2/Al2O3 multilayers

M. de Pauli, A. Malachias, H. Westfahl, J. Bettini, A. Ramirez, G. S. Huang, Y. F. Mei, O. G. Schmidt
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3555624
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