Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma

L. Baker, A. S. Cavanagh, D. Seghete, S. M. George, A. J. M. Mackus, W. M. M. Kessels, Z. Y. Liu, F. T. Wagner
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3555091