Atomic-scale origins of bias-temperature instabilities in SiC–SiO2 structures

  • Xiao Shen, En Xia Zhang, Cher Xuan Zhang, Daniel M. Fleetwood, Ronald D. Schrimpf, Sarit Dhar, Sei-Hyung Ryu, Sokrates T. Pantelides
  • Applied Physics Letters, February 2011, American Institute of Physics
  • DOI: 10.1063/1.3554428

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http://dx.doi.org/10.1063/1.3554428

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