Fabrication of uniform Ge-nanocrystals embedded in amorphous SiO2 films using Ge-ion implantation and neutron irradiation methods

  • Q. Chen, T. Lu, M. Xu, C. Meng, Y. Hu, K. Sun, I. Shlimak
  • Applied Physics Letters, February 2011, American Institute of Physics
  • DOI: 10.1063/1.3553770

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http://dx.doi.org/10.1063/1.3553770

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