Electronic structures of Ga2O3(Gd2O3) gate dielectric on n-Ge(001) as grown and after CF4 plasma treatment: A synchrotron-radiation photoemission study

T.-W. Pi, W. C. Lee, M. L. Huang, L. K. Chu, T. D. Lin, T. H. Chiang, Y. C. Wang, Y. D. Wu, M. Hong, J. Kwo
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3553442
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