Grain boundary assisted degradation and breakdown study in cerium oxide gate dielectric using scanning tunneling microscopy

K. Shubhakar, K. L. Pey, S. S. Kushvaha, S. J. O’Shea, N. Raghavan, M. Bosman, M. Kouda, K. Kakushima, H. Iwai
  • Applied Physics Letters, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3553190
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