Grain boundary assisted degradation and breakdown study in cerium oxide gate dielectric using scanning tunneling microscopy

  • K. Shubhakar, K. L. Pey, S. S. Kushvaha, S. J. O’Shea, N. Raghavan, M. Bosman, M. Kouda, K. Kakushima, H. Iwai
  • Applied Physics Letters, February 2011, American Institute of Physics
  • DOI: 10.1063/1.3553190

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http://dx.doi.org/10.1063/1.3553190

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