The effect of He plasma treatment on properties of organosilicate glass low-k films

O. V. Braginsky, A. S. Kovalev, D. V. Lopaev, E. M. Malykhin, Yu. A. Mankelevich, O. V. Proshina, T. V. Rakhimova, A. T. Rakhimov, D. G. Voloshin, A. N. Vasilieva, S. M. Zyryanov, E. A. Smirnov, M. R. Baklanov
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3549733
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The following have contributed to this page: Dr Dmitry Viktorovich Lopaev