Epitaxial SrO interfacial layers for HfO2–Si gate stack scaling

  • C. Marchiori, M. M. Frank, J. Bruley, V. Narayanan, J. Fompeyrine
  • Applied Physics Letters, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3549202

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http://dx.doi.org/10.1063/1.3549202

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