Impact of SF[sub 6] plasma treatment on performance of TaN–HfO[sub 2]–InP metal-oxide-semiconductor field-effect transistor

Yanzhen Wang, Yen-Ting Chen, Han Zhao, Fei Xue, Fei Zhou, Jack C. Lee
  • Applied Physics Letters, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3549197
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