Temperature effect on negative bias-induced instability of HfInZnO amorphous oxide thin film transistor

  • Dae Woong Kwon, Jang Hyun Kim, Ji Soo Chang, Sang Wan Kim, Wandong Kim, Jae Chul Park, Ihun Song, Chang Jung Kim, U In Jung, Byung-Gook Park
  • Applied Physics Letters, February 2011, American Institute of Physics
  • DOI: 10.1063/1.3549180

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http://dx.doi.org/10.1063/1.3549180

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