Surface passivation of crystalline silicon by plasma-enhanced chemical vapor deposition double layers of silicon-rich silicon oxynitride and silicon nitride

Johannes Seiffe, Luca Gautero, Marc Hofmann, Jochen Rentsch, Ralf Preu, Stefan Weber, Rüdiger A. Eichel
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3544421
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