Mechanism of plasma-induced damage to low-k SiOCH films during plasma ashing of organic resists

Keigo Takeda, Yudai Miyawaki, Seigo Takashima, Masanaga Fukasawa, Keiji Oshima, Kazunori Nagahata, Tetsuya Tatsumi, Masaru Hori
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3544304
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