Investigation of oxygen-related defects and the electrical properties of atomic layer deposited HfO[sub 2] films using electron energy-loss spectroscopy

Jae Hyuck Jang, Hyung-Suk Jung, Jeong Hwan Kim, Sang Young Lee, Cheol Seong Hwang, Miyoung Kim
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3544039