Growth and magnetism of low-temperature deposited Fe/Si(111) films as an intermediate layer for suppression of silicide formation

Wen-Ting Tu, Chih-Hsiung Wang, Ya-Yun Huang, Wen-Chin Lin
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3537832
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