Ultrananocrystalline diamond film deposition by direct-current plasma assisted chemical vapor deposition using hydrogen-rich precursor gas in the absence of the positive column

Hak-Joo Lee, Hyeongtag Jeon, Wook-Seong Lee
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3533764
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