High order symmetry interference lithography based nanoimprint

Alban A. Letailleur, Komla Nomenyo, Stefan Mc Murtry, Etienne Barthel, Elin So̸ndergård, Gilles Lérondel
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3530729
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