Effect of temperature and V/III ratio on the initial growth of indium nitride using plasma-assisted metal-organic chemical vapor deposition

S. Y. Chiang, P. H. Tseng, P. Wadekar, S. Hamad, H. W. Seo, D. P. Norman, L. W. Tu
  • Journal of Applied Physics, January 2011, American Institute of Physics
  • DOI: 10.1063/1.3530581