Mechanisms of deposition and etching of thin films of plasma‐polymerized fluorinated monomers in radio frequency discharges fed with C2F6‐H2and C2F6‐O2mixtures

  • Riccardo d’Agostino, Francesco Cramarossa, Francesca Illuzzi
  • Journal of Applied Physics, April 1987, American Institute of Physics
  • DOI: 10.1063/1.337864

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http://dx.doi.org/10.1063/1.337864

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