Improved insight in charge trapping of high-k ZrO[sub 2]/SiO[sub 2] stacks by use of tunneling atomic force microscopy

M. Lemberger, A. J. Bauer, A. Paskaleva, V. Yanev, M. Rommel
  • Journal of Applied Physics, January 2008, American Institute of Physics
  • DOI: 10.1063/1.2957072
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The following have contributed to this page: Dr. Mathias Rommel